Nordiko N2000

The N2000 is a compact sputtering system with four 150 mm electrodes mounted in a confocal configuration. The electrodes sputter material onto a central rotating worktable. Designed to coat substrates up to 200 mm diameter the system combines great flexibility with substantial capability.

The system may be fitted with a linear single wafer/platen vacuum load lock. Or for more demanding throughput with a compact four wafer or 25 wafer cassette load lock.

Features:

  • Rotation substrate deposition
  • 200 mm wafer/platen
  • Variable source to substrate separation
  • Co-sputtering
  • Reactive deposition
  • DC/RF sputtering.

Optionals:

  • Substrate RF bias
  • Substrate heating
  • In-situ substrate plane magnetic field projection.

Nordiko N2000 compact sputtering system