Nordiko 2000 and 2550 Series Batch Load Physical Vapour Deposition Systems.

These are highly flexible and very capable automatic sputtering systems.

The 2000 and 2550 share a common process module. The 2000 may be configured either for atmospheric cycling to load a batch, or with a single shot load lock. When this module is mated to a wafer handling platform that accesses a vacuum cassette load lock then the machine designation becomes the 2550.

Two alternative electrode populations are offered; either,

Four 200 mm cathodes, or
Six 150 mm cathodes.

Each cathode may be configured for RF diode, DC, RF or DC/RF magnetron operation.

The rotating substrate table may be configured to accept a variety of differing substrate formats. The table may be rotated at speeds from 2 to 30 rpm. The table height can also be raised and lowered to optimise the process.

The smallest our flexible batch PVD series, suited to processing 100 mm substrates.